Designs and Implementations of Low-Leakage Digital Standard Cells Based on Gate-Length Biasing

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Designs and Implementations of Low-Leakage Digital Standard Cells Based on Gate- Length Biasing

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15 صفحه اول

Gate Leakage

1) Introduction Recent systems are built of MOSFET transistors. Here, MO stands for metal oxide and FE for field effect. This means, that – in contrast to bipolar transistors – the gate is isolated by a metal oxide (today SiO2) and the channel is just controlled by the field through this oxide. Thus theoretically, the principal of MOSFET devices is that there is no current flowing through the g...

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ژورنال

عنوان ژورنال: Research Journal of Applied Sciences, Engineering and Technology

سال: 2013

ISSN: 2040-7459,2040-7467

DOI: 10.19026/rjaset.5.4606